Â Â Â ê¸°ìˆ :CLOT 부티í¬
   스í¼í„°ë§ì€ 새로운 ìœ í˜•ì˜ PVD(Physical Vapor Deposition) 방법입니다.
   Sputtering is widely used in: flat panel displays, glass industry (include architectural glass, automotive glass, optical film glass), solar cells, surface engineering, recording media, microelectronics, automotive lights and decorative coating, etc..
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   스í¼í„°ë§ì€ 주로 í‰ë©´ íŒ¨ë„ ë””ìŠ¤í”Œë ˆì´, 코팅 ìœ ë¦¬ ì‚°ì—…(건축 ìœ ë¦¬, ìžë™ì°¨ ìœ ë¦¬, ê´‘í•™ ìœ ë¦¬ ë° ê¸°íƒ€ 필름 í¬í•¨), 박막 태양열, 표면 공학(ìž¥ì‹ ë° ë„구), (ìžê¸°, ê´‘í•™) ê¸°ë¡ ë§¤ì²´ 마ì´í¬ë¡œì¼ë ‰íŠ¸ë¡œë‹‰ìŠ¤ ìžë™ì°¨ 조명, ìž¥ì‹ ì½”íŒ…ì— ì‚¬ìš©ë©ë‹ˆë‹¤.
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   In the field of Rotatable Target, proposed the monolithic tube target in the year 2009,which has been recognized by domestic and foreign customers. We can provide the following sizes according to the requirements of customers:
   Planar target: single weight:≤260kg, purity:≥99.97%
   ëŒë¦´ìˆ˜ 있는 í‘œì : OD: Φ140-180mm, ID: Φ125-Φ135mm. ê¸¸ì´ â‰¤ 3300mm, ìˆœë„ : ≥99.97 %
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   Chemical Composition
| Mo ë‚´ìš© | 다른 ìš”ì†Œì˜ ë‚´ìš©ì˜ í•© | ê° ìš”ì†Œ ë‚´ìš© |
|---|---|---|
| ≥99.97% | ≤0.03% | ≤0.001% |
